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Now showing items 11-18 of 18
A cost effective and consummate fabrication teaching set up for microelectronic engineering undergraduate
(Malaysian Invention & Design Society (MINDS), 2005-05-19)
The package, which is fully designed and developed using KUKUM in-house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia.
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)
Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The ...
Silicon Nanowires
(AFAG Messen & Ausstellungen GmbH, 2007-11-01)
Silicon Nanowires with diameter or width of the order of a nanometer or 10o meter and length of the order of microns propel for a novel research in the construction of atomically controlled periodic systems with reduced ...
MOSFET Technology for Microelectronic Engineering Undergraduate Programme
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
This project focused on the process development of MOSFET fabrication. Microelectronic fabrication equipment and facilities from the micro fabrication cleanroom laboratory in KUKUM were used for the purposes of this project. ...
A Cost Effective Negative Plenum Cleanroom for Microelectronic Engineering Undergraduate Programme
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
To design and build a microelectronic cleanroom which is compatible to other commercially installed clenroom for the purpose of teaching undergraduate and postgraduate students in the field of microelectronic fabrication.
Design and process development of silicon nanowire based DNA biosensor using electron beam lithography
(Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)
Silicon nanowires (SiNWs) have their unique feature such as similar diameters to biomolecules, chemically tailorable physical properties, enable to apply in biomolecule detection and can be fabricated as a high performance ...
MOS Transistor Mask Design Using SEM Based E-Beam Lithography
(Malaysian Invention & Design Society (MINDS), 2006-05-19)
Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature ...
Nanowire formation using electron beam lithography
(American Institute of Physics, 2009-06-01)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...