Now showing items 1-20 of 244

    • From sand to Silicon wafer 

      Uda Hashim, Assoc. Prof. Dr. (Kolej Universiti Kejuruteraan Utara Malaysia, 2003-07)
    • High speed and low power devices : bulk silicon versus SOI 

      Uda Hashim, Assoc. Prof. Dr. (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-04)
    • SOI Single-Electron Transistors (SET) design and process development 

      Amiza, Rasmi; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      Single-electron transistor (SET) is attractive devices to use for large-scale integration. SET can be made very small, dissipate little power, and can measure quantities of charge much faster than MOSFETs. This makes SET ...
    • Development of In-House MOS transistor at KUKUM Micro Fabrication Cleanroom: Microelectronic undergraduate activities 

      Marlia, Morsin; Nur Hamidah, Abdul Halim; Uda, Hashim; Hashim, Saim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      This paper presents the module development of inhouse MOS transistor device at KUKUM Micro Fabrication Cleanroom. The process started with the establishment of process flow, process modules, and process parameters. Four ...
    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...
    • Design and fabricate Mosfet Masks at KUKUM Microfabrication Cleanroom for teaching undergraduates 

      Mohd Zainizan, Sahdan; Uda, Hashim; Hashim, Saim; Marlia, Morsin (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      In teaching undergraduates program in MOSFET fabrication, mask set is one of the major problem since the cost is extensively high. The purpose of these masks is to define certain region on a wafer. In this work, a low ...
    • A cost effective and consummate fabrication teaching set up for microelectronic engineering undergraduate 

      Uda, Hashim, Prof. Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Malaysian Invention & Design Society (MINDS), 2005-05-19)
      The package, which is fully designed and developed using KUKUM in-house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia.
    • MOSFET Technology for Microelectronic Engineering Undergraduate Programme 

      Zul Azhar, Zahid Jamal, Prof. Dr.; Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor (Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
      This project focused on the process development of MOSFET fabrication. Microelectronic fabrication equipment and facilities from the micro fabrication cleanroom laboratory in KUKUM were used for the purposes of this project. ...
    • A Cost Effective Negative Plenum Cleanroom for Microelectronic Engineering Undergraduate Programme 

      Uda, Hashim, Prof. Madya Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor (Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
      To design and build a microelectronic cleanroom which is compatible to other commercially installed clenroom for the purpose of teaching undergraduate and postgraduate students in the field of microelectronic fabrication.
    • The effect of temperature, pH and exposure time to Electroless Nickel Deposition for Under Bump Metallurgy (UBM) 

      Mohd Khairuddin, Md Arshad; Ibrahim, Ahmad; Azman, Jalar; Uda, Hashim (Universiti Putra Malaysia (UPM), 2005-12-06)
      The low cost deposition of under bump metallurgy (UBM) method presented in this paper is based on electroless nickel immersion gold (ENIG) bumping process. The study is focuses on the effect of temperature, pH and exposure ...
    • A new Microelectronic Engineering degree curriculum in KUKUM 

      Yufridin, Wahab; Ali Yeon, Md Shakaff; Zul Azhar, Zahid Jamal; Zuraidah, Mohd Zain; Reha, Abdul Razak; Uda, Hashim (Association of Engineering Education in South East Asia and the Pacific, 2005-12-08)
      This paper presents the development and implementation of a new curriculum at the Kolej Universiti Kejuruteraan Utara Malaysia (KUKUM). The curriculum is specifically developed for the Bachelor of Engineering Degree program ...
    • Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist 

      Mohammad Nuzaihan, Md Nor; Uda, Hashim; Nur Hamidah, Abdul Halim; Bajuri, S. N M (Nano Science and Technology Institute, 2006)
      Experimental studies of nanowires formation are carried out by using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design ...
    • Reproducibility of silicon single electron quantum dot transistor 

      Uda, Hashim; Sutikno, Madnarski (Nano Science and Technology Institute, 2006)
      In principle, based on the form of tunnel junction, single electron transistor (SET) can be classified into four types, i.e. nanowire SET, quantum dot SET, nanotube SET and point contact SET. Another classification is SET ...
    • The characterization of power supply noise for optical mouse sensor 

      Mohd Khairuddin, Md Arshad; Uda, Hashim; Ming, Choo Chew (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      The induced power supply noise (sinusoidal waveform) that injected to Vdd pin will cause unwanted spike at the positive amplitude and negative amplitude to the DC input voltage. At certain limit this spike will cause the ...
    • Characterization of robust alignment mark to improve alignment performance 

      Normah, Ahmad; Uda, Hashim; Mohd Jefrey, Manaf; Kader, Ibrahim (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      Overlay requirement is one of the biggest obstacles in achieving a very small feature. With the continued growth of small feature size, overlay requirement becomes tighter. Such a tight requirement requires a very high ...
    • Characteristics of Serial Peripheral Interfaces (SPI) timing parameters for optical mouse sensor 

      Mohd Khairuddin, Md Arshad; Uda, Hashim; Choo, C.M. (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      In this paper we report the characterizations results of Serial Peripheral Interface (SPI) timing parameters for optical mouse sensor. SPI is an interface that facilitates the transfer of synchronous serial data. It supports ...
    • Design of 100nm single-electron transistor (SET) by 2D TCAD simulation 

      Amiza, Rasmi; Uda, Hashim; Awang Mat, Abd F (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      One of the great problems in current large-scale integrated circuits (LSIs) is increasing power dissipation in a small silicon chip. Single-electron transistor (SET) which operate by means of one-by-one electron transfer, ...
    • Alignment mark architecture effect on alignment signal behavior in advanced lithography 

      Normah, Ahmad; Uda, Hashim; Mohd Jeffrey, Manaf; Kader Ibrahim, Abdul Wahab (Institute of Electrical and Electronics Engineering (IEEE), 2006)
      The downscaling of CMOS technology becomes a challenge to the scanner alignment system since overlay and alignment accuracy becomes tighter. Such a tight overlay requirement requires a very stable alignment performance. A ...
    • Affordable and Effective Microelectronic Engineering Teaching Package for Undergraduate Programme 

      Uda, Hashim, Prof. Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor (International Exhibition of Inventions, 2006-04-05)
      The package, which is fully designed developed, using KUKUM in house expertise, is the first teaching laboratory that is purposely built for undergraduate microelectronic program in Malaysia.
    • MOS Transistor (Fabricated Using In-House Low Cost Facilities) 

      Uda, Hashim, Prof. Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohammadd Nuzaihan, Mohd Nor; Mohd Sallehudin, Saad; Phang, Keng Chew; Haffiz, Abd Razak; Bahari, Man (Malaysian Invention & Design Society (MINDS), 2006-05-19)
      MOS Transistor is divided into two types: NMOS and PMOS. Majority carrier od NMOS is electrons whereby PMOS is holes. The MOS transistor consists of three regions namely source, drain and gate. Fabrication of MOS transistor ...