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    MOS Transistor (Fabricated Using In-House Low Cost Facilities)

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    Date
    2006-05-19
    Author
    Uda, Hashim, Prof. Dr.
    Zul Azhar, Zahid Jamal, Prof. Dr.
    Nur Hamidah, Abdul Halim
    Mohammadd Nuzaihan, Mohd Nor
    Mohd Sallehudin, Saad
    Phang, Keng Chew
    Haffiz, Abd Razak
    Bahari, Man
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    Abstract
    MOS Transistor is divided into two types: NMOS and PMOS. Majority carrier od NMOS is electrons whereby PMOS is holes. The MOS transistor consists of three regions namely source, drain and gate. Fabrication of MOS transistor is done on 100mm silicon wafer. The active region of the transistor, which are source and drain are formed by either solid or liquid dopant. These transistors were fabricated using in-house low cost facility which is designed and developed by KUKUM internal expertise. The fabrication work is done in the cleanroom Class ISO 5 and ISO 6.
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    http://dspace.unimap.edu.my/123456789/8298
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    • Zul Azhar Zahid Jamal, Dato' Prof. Dr. [47]
    • Universiti Malaysia Perlis [470]
    • Uda Hashim, Prof. Ts. Dr. [243]

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