Browsing Uda Hashim, Prof. Ts. Dr. by Issue Date
Now showing items 21-40 of 244
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MOS Transistor Mask Design Using SEM Based E-Beam Lithography
(Malaysian Invention & Design Society (MINDS), 2006-05-19)Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature ... -
The effects of multiple zincation process on Aluminum Bond Pad surface for Electroless Nickel Immersion Gold deposition
(American Society of Mechanical Engineers (ASME), 2006-09)This paper reports the effects of a multiple zincation processon the Al bond pad surface prior to electroless nickel immersion gold deposition. The study of multiple zincation comprises the surface topogtaphy and morphology ... -
Under Bump Metallurgy (UBM)-a technology review for flip chip packaging
(Department of Mechanical Engineering, University Malaya, 2007)Flip chip packaging technology has been utilized more than 40 years ago and it still experiencing an explosives growth. This growth is driven by the need for high performance, high volume, better reliability, smaller size ... -
Effect of alignment mark architecture on alignment signal behavior in advanced lithography
(Universiti Malaya, 2007)Alignment mark architecture is divided into two types, which depending on where the mark is defined. Alignment mark that is defined through the contact masking steps is known as contact mark and alignment mark that is ... -
Designing of masks for quantum dot single electron transistor fabrication using E-beam nanolithography
(Nano Science and Technology Institute, 2007)Quantum dot single electron transistor (QD SET) is able to be fabricated through a joint technique of e-beam lithography (EBL), pattern dependent oxidation (PADOX) and high density plasma etching. In this research, we have ... -
Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
(Universiti Kebangsaan Malaysia, 2007)This paper involves the planarization of borophosphosilicate glass (BPSG) film using a new recipe for annealing process to improve the borophosphosilicate glass (BPSG) film flatness after reflow. This improvement is for ... -
Nanogap Dielectric Biosensor for label free DNA Hybridization detection
(Universiti Malaysia Perlis, 2007)Sensors based on nanogap capacitance changes are being developed for genomic and proteomic applications because they offer label-free detection on platforms amenable to high throughput configurations. This paper presents ... -
A simple oxidation technique for quantum dot dimension shrinkage and tunnel barriers generation
(Elsevier B.V., 2007-05)The tunnel barriers generation and the quantum dot size shrinkage play a significant role in single-electron transistor (SET) fabrication. Because the numerically etch indicators were not found, the technical indicators, ... -
Quantum Dot Single Electron Transistor Structure Formation Using E-Beam Lithography
(C. I. S. Network, 2007-05-18)To achieve room temperature operation of single electron transistor (SET). To form single dot chanted for electron transport in SET via the Coufomb Blockade Oscillation (CBO) phenomenon. -
Silicon Nanowires
(Malaysian Invention and Design Society (MINDS), 2007-05-18)Silicon Nanowires is a new class of materials that have attracted attention and great research interest in the last few years because of their great potential applications in nanotechnology such as: - nanoelectronic ... -
A systematic dry etching process for profile control of quantum dots and nanoconstrictions
(Elsevier B.V., 2007-08)In essence, quantum dot dimensions and others can be laterally and vertically defined by using either bottom up or top down methods respectively. In fabrication that uses top down method, etch process hold a chief role. ... -
An estimation of the energy and exergy efficiencies for the energy resources consumption in the transportation sector in Malaysia
(Elsevier Ltd., 2007-08)The purpose of this work is to apply the useful energy and exergy analysis models for different modes of transport in Malaysia and to compare the result with a few countries. In this paper, energy and exergy efficiencies ... -
Semiconductor Nanowire
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)Semiconductor Nanowire represents an important and broad class of nanometer scale wire structure. Semiconductor Nanowire is a wire of dimension of the order of a nanometer or 10-9 meters. It is the one thousand times ... -
Mask Making Process (Positive and Negative Mask)
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ... -
Quantum Dot Single Electron Transistor: Design and Fabrication
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)To achieve room temperature operation of single electron transistor (SET). To form single dot chanted for electron transport in SET via the Coufomb Blockade Oscillation (CBO) phenomenon. -
Silicon Nanowires
(AFAG Messen & Ausstellungen GmbH, 2007-11-01)Silicon Nanowires with diameter or width of the order of a nanometer or 10o meter and length of the order of microns propel for a novel research in the construction of atomically controlled periodic systems with reduced ... -
Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
(Springer New York, 2007-12)We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ... -
Characterization of intermetallic growth of gold ball bonds on aluminum bond pads
(University of Malaya, 2008)In this paper the intermetallic growth between gold ball bond and aluminum bond pad are studied. It involves thermal aging at 150 °C and 200 °C for various time intervals. The relationship between electrical resistance and ... -
Effect of alignment mark depth on alignment signal behavior in advanced lithography
(Universiti Malaysia Perlis, 2008)Finding a robust alignment strategy is one of the key evaluations in defining photolithography process. Alignment is a process to determine how the current pattern is placed on the wafer. Alignment is done by an optical ... -
Quantum DOT Single Electron Transistor
(School of Microelectronic Engineering, 2008-01-09)