• Login
    View Item 
    •   DSpace Home
    • Journal Articles
    • School of Microelectronic Engineering (Articles)
    • View Item
    •   DSpace Home
    • Journal Articles
    • School of Microelectronic Engineering (Articles)
    • View Item
    JavaScript is disabled for your browser. Some features of this site may not work without it.

    Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology

    Thumbnail
    View/Open
    Abstract (7.924Kb)
    Date
    2007
    Author
    Uda, Hashim
    Ramzan, Mat Ayub
    Nik Hazura, Nik Hamat
    Metadata
    Show full item record
    Abstract
    This paper involves the planarization of borophosphosilicate glass (BPSG) film using a new recipe for annealing process to improve the borophosphosilicate glass (BPSG) film flatness after reflow. This improvement is for 0.35μm technology using steam annealing method at different temperatures. This process allows the planarization of wafers with thin layer at its surface. In this paper we present the comparison between the effect of hydrofluoric acid (HF) staining on the cross sectional topography with the samples without hydrofluoric acid (HF) staining analyzed by field emission scanning electron microscopy (FESEM). We found that staining with HF produced clearer images.
    URI
    http://pkukmweb.ukm.my/~jsm/
    http://dspace.unimap.edu.my/123456789/6889
    Collections
    • School of Microelectronic Engineering (Articles) [183]
    • Uda Hashim, Prof. Ts. Dr. [243]

    Atmire NV

    Perpustakaan Tuanku Syed Faizuddin Putra (PTSFP) | Send Feedback
     

     

    Browse

    All of UniMAP Library Digital RepositoryCommunities & CollectionsBy Issue DateAuthorsTitlesSubjectsThis CollectionBy Issue DateAuthorsTitlesSubjects

    My Account

    LoginRegister

    Statistics

    View Usage Statistics

    Atmire NV

    Perpustakaan Tuanku Syed Faizuddin Putra (PTSFP) | Send Feedback