Browsing School of Microelectronic Engineering (Articles) by Subject "Lithography"
Now showing items 1-3 of 3
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Alignment mark architecture effect on alignment signal behavior in advanced lithography
(Institute of Electrical and Electronics Engineering (IEEE), 2006)The downscaling of CMOS technology becomes a challenge to the scanner alignment system since overlay and alignment accuracy becomes tighter. Such a tight overlay requirement requires a very stable alignment performance. A ... -
Effect of alignment mark architecture on alignment signal behavior in advanced lithography
(Universiti Malaya, 2007)Alignment mark architecture is divided into two types, which depending on where the mark is defined. Alignment mark that is defined through the contact masking steps is known as contact mark and alignment mark that is ... -
Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
(Springer New York, 2007-12)We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ...