Now showing items 1-4 of 4

    • Characterisation of laser-treated Ag, Al, and Al/Ag metal thin films deposited by DC sputtering 

      Aliyu, Kabiru Isiyaku; Ahmad Hadi, Ali; Nafarizal, Nayan (Universiti Malaysia Perlis, 2020-01)
      Structural, optical and electrical properties of Nd:YAG pulsed laser-treated silver (Ag), Aluminium (Al) and Al/Ag bi-layer metal thin films deposited by Direct Current (DC) sputtering technique is investigated. Laser-metal ...
    • Effect of discharge power on the properties of GaN thin films on AlN-(002) prepared by magnetron sputtering deposition 

      Muliana, Tahan; Nafarizal, Nayan; Siti Noraiza, Abd Razak; Anis Suhaili, Bakri; Zulkifli, Azman; Mohd Zainizan, Sahdan; Nur Amaliyana, Rahip; Ahmad Shuhaimi, Abu Bakar; Mohd Yazid, Ahmad (Universiti Malaysia Perlis (UniMAP), 2020-07)
      Aluminum nitride (AlN) and gallium nitride (GaN) thin films were grown on silicon (Si) substrates using the conventional RF magnetron sputtering plasma deposition system. The growth rate of GaN increased as the deposition ...
    • Effects of atmospheric pressure plasma jet treatment duration to the viability of Hela cells and microtissues 

      Chin, Fhong Soon; Phriya, Mohana; Elfa Rizan, Rizon; Intan Sue Liana, Abdul Hamid; Naznin, Sultana; Marlia, Morsin; Kian, Sek Tee; Gim, Pao Lim; Mohd Khairul, Ahmad; Nafarizal, Nayan (Universiti Malaysia Perlis (UniMAP), 2020-07)
      Non-thermal atmospheric plasma jet (NTAPPJ) is believed to be effective in treating monolayer cells cultured in-vitro due to the oxidative stresses induced. However, it is controversial whether studying the impact of plasma ...
    • Rapid response room temperature oxygen sensor based on Trivalent-Elements doped TiO2 thin film 

      Nor Damsyik, Mohd Said; Mohd Zainizan, Sahdan; Nafarizal, Nayan; Anis Suhaili, Bakri; Nur Amaliyana, Raship; Hashim, Saim; Kusnanto Mukti Wibowo; Feri Adriyanto (Universiti Malaysia Perlis (UniMAP), 2021-07)
      Trivalent metal-doped TiO2 thin films have been extensively investigated in gas sensor applications. The trivalent metal dopants are Al, Y and Gd. The trilayer fabrication of a gas sensor consists of a thin film, sputtered ...