This paper mainly represent the simple and effective method to design the chrome mask for patterning the platform for zinc oxide nanowire growth. The most essential aspect that need to be considered in designing the chrome ...

Currently, Computer simulation has become an essential part of nanotechnology and engineering and science. Digital analysis of components, in particular, is important when developing new products or optimizing designs. ...

The plant disease such as Cucumber Mosaic Virus (CMV) and Papaya Ring Spot Virus (PRSV) is a most dangerous disease that can decrease productivity and quality of the vegetable and fruit. Besides that, its also can destroy ...

In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...

The paper present a report on fabrication of Nanowire using plasma oxidation, we monitor changes by studying the morphology and Δw/Δh, the study also revealed that the proposed fabrication method could potentially be used ...

The use of Silicon nanowires has allowed the introduction of many new signal transduction technologies in biosensors. The sensitivity and performance of biosensors is being improved by using doping process for their ...

ZnO nanowires are ideal building blocks for a wide range of nanoscale electronics, optoelectronics, and chemical sensing devices. The material properties change when the material is in nanowire form as compare to thin film ...

Miniaturization of Biosensors based on nanotechnology are rapidly developing with gaining of undisputable ground and are becoming widespread in the biomedical with capability of improving the existing current diagnosis ...

Semiconductor Nanowire represents an important and broad class of nanometer scale wire structure. Semiconductor Nanowire is a wire of dimension of the order of a nanometer or 10-9 meters. It is the one thousand times ...

In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...