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Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
(Institute of Electrical and Electronics Engineers (IEEE), 2012)
In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...
Fabrication of nanowire using ash trimming technique
(Trans Tech Publications, 2013)
The paper present a report on fabrication of Nanowire using plasma oxidation, we monitor changes by studying the morphology and Δw/Δh, the study also revealed that the proposed fabrication method could potentially be used ...