Now showing items 1-3 of 3

    • Mask Making Process (Positive and Negative Mask) 

      Uda, Hashim, Prof. Dr.; Nur Hamidah, Abdul Halim; Mohamad Nuzaihan, Md Nor; Zul Azhar, Zahid Jamal, Prof. Dr. (Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
      Generally, two types of masks are used in MOSFET fabrication; positive mask and negative mask. These resists mask can be used either in lift off process or conventional lithography step depends on the fabrication process ...
    • Quantum Dot Single Electron Transistor: Design and Fabrication 

      Uda, Hashim, Prof. Dr.; Zul Azhar, Zahid Jamal, Prof. Dr.; Samsudi, Sakrani, Prof. Dr.; Madnarski, Sutikno (Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
      To achieve room temperature operation of single electron transistor (SET). To form single dot chanted for electron transport in SET via the Coufomb Blockade Oscillation (CBO) phenomenon.
    • Semiconductor Nanowire 

      Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; Nur Hamidah, Abdul Halim (Kementerian Pengajian Tinggi Malaysia (KPTM), 2007-08-10)
      Semiconductor Nanowire represents an important and broad class of nanometer scale wire structure. Semiconductor Nanowire is a wire of dimension of the order of a nanometer or 10-9 meters. It is the one thousand times ...