Now showing items 1-5 of 5

    • CdS film thickness characterization by R.F. magnetron sputtering 

      Uda, Hashim, Prof. Dr.; Kasim, Abdul Rahman; Hakim; Mohd Azri, Othman (American Institute of Physics, 2009-06-01)
      In this work, cadmium sulphide (CdS) target with 99.999% purity was used as a target in RF magnetron sputtering. The sputtering experiment was conducted onto silicon oxide substrates at different temperatures ranging from ...
    • Design of digital control frequency sinusoidal wave generator for dielectric analyzer 

      A., Saifullah; Uda, Hashim, Prof. Dr. (Universiti Malaysia Pahang, 2009-06-20)
      The dielectric analyses are usually done using capacitance measurement technique. A set of sinusoidal wave frequency are applied to the capacitance. This paper is about the design of digital control frequency of ...
    • Man-2403 resist development for electron beam lithography process 

      Nur Hamidah, Abdul Halim; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Pahang, 2009-06-20)
      Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ...
    • Nanogap biosensor development for DNA immobilization and hybridization detection 

      Th. S., Dhahi; Uda, Hashim; N. M., Ahmed; A., Mat Taib (Universiti Malaysia Pahang, 2009-06-20)
      In the past two decades, the biological and medical fields have seen great advances in the development of biosensors and biochips capable of characterizing and quantifying biomolecules. To understand the important ...
    • Pattern designed for combination of optical lithography and electron beam lithography 

      S. Fatimah, Abd Rahman; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor; A. M., Mohamed Nuri; Muhamad Emi Azri, Shohini (Universiti Malaysia Pahang, 2009-06-20)
      In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ...