Browsing Uda Hashim, Prof. Ts. Dr. by Subject "Lithography, Electron beam"
Now showing items 1-3 of 3
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Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
(Springer New York, 2007-12)We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ... -
PMMA characterization and optimization for Nano Structure formation
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ... -
SOI Single-Electron Transistors (SET) design and process development
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)Single-electron transistor (SET) is attractive devices to use for large-scale integration. SET can be made very small, dissipate little power, and can measure quantities of charge much faster than MOSFETs. This makes SET ...