Now showing items 1-3 of 3

    • Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication 

      Sutikno, Madnasri; Uda, Hashim; Zul Azhar, Zahid Jamal (Springer New York, 2007-12)
      We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ...
    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...
    • SOI Single-Electron Transistors (SET) design and process development 

      Amiza, Rasmi; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      Single-electron transistor (SET) is attractive devices to use for large-scale integration. SET can be made very small, dissipate little power, and can measure quantities of charge much faster than MOSFETs. This makes SET ...