Browsing Institute of Nano Electronic Engineering (INEE) (Articles) by Subject "ma-N2400 negative resist"
Now showing items 1-2 of 2
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Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
(Trans Tech Publications, 2014)A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of ... -
Negative Pattern Scheme (NPS) design for nanowire formation using scanning electron microscope based electron beam lithography technique
(Trans Tech Publications, 2014)In this work, we report the used of Negative Pattern Scheme (NPS) by Electron Microscope Based Electron Beam Lithography (EBL) Technique in connection with scanning electron microscope (SEM) for creating extremely fine ...