Now showing items 1-5 of 5

    • Fabrication of Amorphous silicon Microgap Structure for Energy Saving Devices 

      Thikra, S. Dhahi; Uda, Hashim; Md. Eaqub, Ali; Nazwa, Taib (Universiti Kebangsaan Malaysia, 2011-11-18)
      We report here the fabrication of microgaps electrodes on amorphous silicon using low cost techniques such as vacuum deposition and conventional lithography. Amorphous silicon is a low cost material and has desirable ...
    • Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method 

      Mohammad Nuzaihan, Md Nor; Uda, Hashim, Prof. Dr.; Nazwa, Taib; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)
      A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of ...
    • Polysilicon nanogap fabrication using a thermal oxidation process 

      Dhahi, T.S; Uda, Hashim, Prof. Dr.; Md. Eaqub, Ali; Nazwa, Taib (Emerald Group Publishing Limited., 2012)
      Purpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization ...
    • Probing the Ph measurement of self-alligned polysilicon nanogap capacitor 

      Nazwa, Taib; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Noor (Trans Tech Publications, 2012)
      With their bright potential in effective sensing, nanogap capacitor show promise as a device to measure wider aspect of dielectric properties. In this paper, we demonstrate the effectiveness of nanogap capacitor in detecting ...
    • Technology development for nano structure formation: Fabrication and characterization 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Foo, Kai Loong; Dhahi, Th Sabar; Nazwa, Taib (American Scientific Publishers, 2013)
      The paper contain a report on a technology development for nano structure formation using standard CMOS process-based method capable of fabricating precisely control nano wire and nanogap. The fabrication of nanoscale ...