Algorithm to improve process robustness in the assembly & test manufacturing industry a case study of the 1064nm wavelength laser mark equipment
Darin Moreira A/L Anthony Vincent
Bhuvenesh, Prof. Dr. Rajamony
MetadataShow full item record
This document explains and demonstrates the generic improvement algorithm created to enhance the maintenance methodology in the semiconductor manufacturing environment. The use of this algorithm demonstrates how a process and equipment can utilize it and get better output quality from a process and cost standpoint, which is a key driver in any manufacturing industry.