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Now showing items 51-53 of 53
Nanowire formation using electron beam lithography
(American Institute of Physics, 2009-06-01)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
State of the art: PDMS surface treatment for the hydrophilization and hydrophobicity
(Universiti Malaysia Perlis (UniMAP), 2012-06-18)
As advancement in nano laboratory on chip is moving at the speed of light, the Polydimethylsiloxane (PDMS) is frequently used to build microfluidic devices PDMS due to its ease of handling , easy fabrication, transparency ...
Fabrication and characterization of porous silicon using long time low current electrochemical etching
(Universiti Malaysia Perlis (UniMAP), 2012-06-18)
In this paper, the fabrication of porous silicon (PS) layers based on crystalline silicon (c-Si) wafers n-type of (100) orientation using electrochemical etching process was prepared. The effect of various etching time on ...