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    • Preparation and characterization of bulk nanoporous Sn, SnO2 AND Zn 

      Mohd Lutfi, Ahmad Shahar (Universiti Malaysia Perlis (UniMAP)School of Microelectronic Engineering, 2013)
      Extreme ultraviolet lithography (EUVL) has garnered much attention due to its potential in high-volume manufacturing (HVM) of integrated circuit (IC). This research contributes to the study of EUV source target. It has ...