Simulation using default model in ATHENA/SSUPREM4

Abstract

Ion implantation and diffusion processes are very important in the fabrication of bipolar and CMOS transistors. High selectivity’s of ion implantation plays a very important role in forming active device region and low ohmic contact. While annealing process after ion implantation is needed to activate the dopant and repair the damage. However, the diffusion process is accompanied by an anomalous transient enhanced diffusion (TED) of dopant. In order to study the ion implantation and diffusion processes, a process simulation using SSUPREM4 module in ATHENA is the easiest way to be used. However to study and to model the TED, a correct modelling must be adopted. As the right method, the simulation had to start with the default model before any other model can be used. The model is conducted using SSUPREM4 module in the process simulator ATHENA in SILVACO.