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dc.contributor.authorNoor, N. H. M.
dc.contributor.authorUda, Hashim, Prof. Dr.
dc.contributor.authorMuhamad Emi Azry, Shohini
dc.contributor.authorNuri, A. M. M.
dc.date.accessioned2010-08-18T07:11:14Z
dc.date.available2010-08-18T07:11:14Z
dc.date.issued2009-06-01
dc.identifier.citationVol. 1136, 2009, p.499-503en_US
dc.identifier.issn0094-243X
dc.identifier.urihttp://link.aip.org/link/?APCPCS/1136/499/1
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/8824
dc.descriptionLink to publisher's homepage at http://proceedings.aip.org/en_US
dc.description.abstractIn this study, we present a simple method to form a nanogap between two silicon contacts separated by a thin oxide gap. We also demonstrate the validity of dielectric spectroscopy results of two wafer samples (different oxide thickness), and we show that this vertically separated nanogap is better at providing accurate and conclusive results than a standard setup. The results demonstrate that this nanogap sensor presents a powerful potential platform for identifying conformational states of molecular scale events.en_US
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.relation.ispartofseriesProceedings of the International Conference on Nanoscience and Nanotechnology 2008en_US
dc.subjectCapacitanceen_US
dc.subjectNanofabricationen_US
dc.subjectNanogapen_US
dc.subjectSilicon contactsen_US
dc.subjectInternational Conference on Nanoscience and Nanotechnology 2008en_US
dc.titleA silicon-oxide-silicon vertically separated electrode nanogap device structureen_US
dc.typeWorking Paperen_US


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