| dc.contributor.author | Nur Hamidah, Abdul Halim | |
| dc.contributor.author | Uda, Hashim, Prof. Dr. | |
| dc.contributor.author | Mohammad Nuzaihan, Md Nor | |
| dc.date.accessioned | 2010-08-13T04:50:02Z | |
| dc.date.available | 2010-08-13T04:50:02Z | |
| dc.date.issued | 2009-06-20 | |
| dc.identifier.uri | http://dspace.unimap.edu.my/123456789/8646 | |
| dc.description | Malaysian Technical Universities Conference on Engineering and Technology organized by Universiti Malaysia Pahang in collaboration with Universiti Tun Hussein Onn Malaysia, Universiti Teknikal Malaysia Melaka & Universiti Malaysia Perlis on
June 20th - 22nd, 2009, at MS Garden Hotel, Kuantan, Pahang, Malaysia. | en_US |
| dc.description.abstract | Line-width of resist patterns is more
susceptible to the developing time than the
thickness of the undeveloped resist. This project
focused on the development of MaN-2403 resist
for e-beam lithography process. The objective of
this project is to observe the effect of exposure
dose and development time to the physical
structure of maN-2403 resist using scanning
electron microscope (SEM) and atomic force
microscopy (AFM). The incomplete development
of exposed resist pattern caused bridging effect in
ma-N2403 resist tone. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Universiti Malaysia Pahang | en_US |
| dc.relation.ispartofseries | Proceedings of the Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) 2009 | en_US |
| dc.subject | E-beam lithography | en_US |
| dc.subject | Resist development | en_US |
| dc.subject | maN-2403 | en_US |
| dc.subject | Malaysian Technical Universities Conference on Engineering and Technology (MUCEET) | en_US |
| dc.title | Man-2403 resist development for electron beam lithography process | en_US |
| dc.type | Working Paper | en_US |
