Browsing Journal of Engineering Research and Education (JERE) by Author "uda@kukum.edu.my"
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Effect of alignment mark depth on alignment signal behavior in advanced lithography
Normah, Ahmad; Uda, Hashim; Mohd Jeffery, Manaf; Kader Ibrahim, Abdul Wahab (Universiti Malaysia Perlis, 2008)Finding a robust alignment strategy is one of the key evaluations in defining photolithography process. Alignment is a process to determine how the current pattern is placed on the wafer. Alignment is done by an optical ...