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    A systematic dry etching process for profile control of quantum dots and nanoconstrictions 

    Madnarski, Sutikno; Uda, Hashim; Zul Azhar, Zahid Jamal (Elsevier B.V., 2007-08)
    In essence, quantum dot dimensions and others can be laterally and vertically defined by using either bottom up or top down methods respectively. In fabrication that uses top down method, etch process hold a chief role. ...
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    Nanowire formation for single electron transistor using SEM based Electron Beam Lithography (EBL) technique: Positive tone vs negative tone e-beam resist 

    Mohammad Nuzaihan, Md Nor; Uda, Hashim; Nur Hamidah, Abdul Halim; Bajuri, S. N M (Nano Science and Technology Institute, 2006)
    Experimental studies of nanowires formation are carried out by using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design ...

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    Author
    Uda, Hashim (2)
    Bajuri, S. N M (1)Madnarski, Sutikno (1)Mohammad Nuzaihan, Md Nor (1)Nur Hamidah, Abdul Halim (1)... View MoreSubject
    Nanostructured materials (2)
    Nanotechnology (2)
    Dry etch process (1)Electron beam lithography (1)ma-N 2405 resist (1)... View MoreDate Issued2007 (1)2006 (1)

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