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Application of e-beam lithography for nanowire development
(Universiti Malaysia Perlis (UniMAP), 2010-10-16)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...
Formation of Si nanostructure using size reduction technique
(Universiti Malaysia Perlis (UniMAP), 2010-10-16)
A simple method for the fabrication of nanogaps using conventional photolithography combined with pattern-size reduction techniques is presented. Silicon material is used to fabricate the nanogap structure and gold is used ...