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Characterization of robust alignment mark to improve alignment performance
(Institute of Electrical and Electronics Engineering (IEEE), 2006)
Overlay requirement is one of the biggest obstacles in achieving a very small feature. With the continued growth of small feature size, overlay requirement becomes tighter. Such a tight requirement requires a very high ...
Alignment mark architecture effect on alignment signal behavior in advanced lithography
(Institute of Electrical and Electronics Engineering (IEEE), 2006)
The downscaling of CMOS technology becomes a challenge to the scanner alignment system since overlay and alignment accuracy becomes tighter. Such a tight overlay requirement requires a very stable alignment performance. A ...