Now showing items 1-2 of 2

    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...
    • Technology development for nano structure formation: Fabrication and characterization 

      Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Foo, Kai Loong; Dhahi, Th Sabar; Nazwa, Taib (American Scientific Publishers, 2013)
      The paper contain a report on a technology development for nano structure formation using standard CMOS process-based method capable of fabricating precisely control nano wire and nanogap. The fabrication of nanoscale ...