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    • PMMA characterization and optimization for Nano Structure formation 

      S Niza, Mohammad Bajuri; Nur Hamidah, Abdul Halim; Mohammad Nuzaihan, Md Nor; Uda, Hashim (Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
      The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...