Browsing Uda Hashim, Prof. Ts. Dr. by Author "Nazwa, Taib"
Now showing items 1-5 of 5
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Fabrication of Amorphous silicon Microgap Structure for Energy Saving Devices
Thikra, S. Dhahi; Uda, Hashim; Md. Eaqub, Ali; Nazwa, Taib (Universiti Kebangsaan Malaysia, 2011-11-18)We report here the fabrication of microgaps electrodes on amorphous silicon using low cost techniques such as vacuum deposition and conventional lithography. Amorphous silicon is a low cost material and has desirable ... -
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
Mohammad Nuzaihan, Md Nor; Uda, Hashim, Prof. Dr.; Nazwa, Taib; Tijjani Adam, Shuwa (Trans Tech Publications, 2014)A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of ... -
Polysilicon nanogap fabrication using a thermal oxidation process
Dhahi, T.S; Uda, Hashim, Prof. Dr.; Md. Eaqub, Ali; Nazwa, Taib (Emerald Group Publishing Limited., 2012)Purpose - Nanogap electrodes have important applications in power saving devices, electrochemical sensors and dielectric detections of biomolecules. The purpose of this paper is to report on the fabrication and characterization ... -
Subnanometer poly-silicon gap structure formation: Comparison study between size expansion and size reduction
Uda, Hashim, Prof. Dr.; Nazwa, Taib; Thikra, S. Dhahi (American Institute of Physics., 2012)This study describes the comparison among the three fabrication methods of an array of poly-silicon nanogap structures. The three different methods are size expansion technique (SET), size reduction technique (SRT) and ... -
Technology development for nano structure formation: Fabrication and characterization
Tijjani Adam, Shuwa; Uda, Hashim, Prof. Dr.; Foo, Kai Loong; Dhahi, Th Sabar; Nazwa, Taib (American Scientific Publishers, 2013)The paper contain a report on a technology development for nano structure formation using standard CMOS process-based method capable of fabricating precisely control nano wire and nanogap. The fabrication of nanoscale ...