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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation78

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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation1748120

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Literature review.pdf118
Conclusion.pdf32
Introduction.pdf28
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References and appendix.pdf23
Abstract, Acknowledgment.pdf22
Result and discussion.pdf16

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