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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation66

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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation5001173

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Literature review.pdf108
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Introduction.pdf27
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References and appendix.pdf21
Abstract, Acknowledgment.pdf20
Result and discussion.pdf14

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