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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation91

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Investigation and Modeling of Boron Diffusion Reduction in Silicon by Flourine Implantation using Numerical Simulation4812058

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Literature review.pdf130
Introduction.pdf39
Conclusion.pdf37
References and appendix.pdf25
Methodology.pdf24
Abstract, Acknowledgment.pdf23
Result and discussion.pdf17

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