Now showing items 1-2 of 2

    • Man-2403 resist development for electron beam lithography process 

      Nur Hamidah, Abdul Halim; Uda, Hashim, Prof. Dr.; Mohammad Nuzaihan, Md Nor (Universiti Malaysia Pahang, 2009-06-20)
      Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ...
    • Silicon nanowire sensor by mix and match lithography process: Fabrication and characterization 

      Uda, Hashim, Prof. Dr. (American Institute of Physics, 2012-06-06)
      Silicon nanowires (SiNWs) have attracted significant interest in the study because of their potential to impact applications from nanoscale electronics to biomedical engineering. E-Beam Lithography couple with standard ...