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Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
(Springer New York, 2007-12)
We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ...
SOI Single-Electron Transistors (SET) design and process development
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
Single-electron transistor (SET) is attractive devices to use for large-scale integration. SET can be made very small,
dissipate little power, and can measure quantities of charge much faster than MOSFETs. This makes SET ...
PMMA characterization and optimization for Nano Structure formation
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)
The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution
because of the small wavelength of the 10-50 keV electrons ...