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    • High‐k Gate Dielectric Selection for Germanium based CMOS Devices 

      Navneet, Gupta; Haldiya, Varun (Universiti Malaysia Perlis (UniMAP), 2018-04)
      This paper presents a systematic approach of material selection for gate oxide material in Germanium (Ge) based CMOS Devices. Various possible high‐k gate dielectrics that can be stacked with Ge substrates are Al2O3, ...