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dc.contributor.authorZaliman, Sauli, Dr.-
dc.contributor.authorRetnasamy, Vithyacharan-
dc.contributor.authorTaniselass, Steven-
dc.contributor.authorNor Shakirina, Nadzri-
dc.contributor.authorHsio Mei, Tan-
dc.contributor.authorKhairul Anwar, Mohamad Khazali-
dc.contributor.authorNooraihan, Abdullah-
dc.date.accessioned2014-04-13T07:40:53Z-
dc.date.available2014-04-13T07:40:53Z-
dc.date.issued2014-01-
dc.identifier.citationApplied Mechanics and Materials, vol.487, 2014, pages 294-297en_US
dc.identifier.issn1662-7482-
dc.identifier.urihttp://dspace.unimap.edu.my:80/dspace/handle/123456789/33663-
dc.descriptionLink to publisher's homepage at http://www.ttp.net/en_US
dc.description.abstractWall shear stress (WSS) is one of the important variables in microfluidic devices. In this paper WSS distribution for a microfluidic device in Forward Facing Step (FFS) configuration has been investigated using Reynolds number 500 and step height 1μm. Numerical simulation was performed usingAnsys-CFX software with the assumption of Newtonian fluid and laminar condition. The simulation result showed that wall shear stress distribution increased after the fluid passing through the step.en_US
dc.language.isoenen_US
dc.publisherTrans Tech Publicationsen_US
dc.subjectForward facing stepen_US
dc.subjectLaminaren_US
dc.subjectMicrofluidicen_US
dc.subjectNewtonian fluiden_US
dc.subjectWall Shear Stress (WSS)en_US
dc.titleWSS investigation in microfluidic FFS channel at Re 500en_US
dc.typeArticleen_US
dc.identifier.urlhttp://www.scientific.net/AMM.487.294-
dc.identifier.doi10.4028/www.scientific.net/AMM.487.294-
dc.contributor.urlvc.sundres@gmail.comen_US
Appears in Collections:Steven Taniselass, Mr.
Vithyacharan Retnasamy
Khairul Anwar Mohamad Khazali, Dr.
Nooraihan Abdullah, Dr.
Zaliman Sauli, Lt. Kol. Professor Dr.
Institute of Engineering Mathematics (Articles)
School of Microelectronic Engineering (Articles)

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