Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/1984
Title: Study of acceleratin voltage influence the Conical structure during Electron Beam Induced Deposition (EBID)
Authors: Muhammad Afif Abdul Rahman
Shaiful Nizam Mohyar (Advisor)
Keywords: Electron beams
Scanning electron microscopes
Silicon
Microelectronics
Microelectronic fabrication
Issue Date: Mar-2008
Publisher: Universiti Malaysia Perlis
Abstract: Electron beam induced deposition (EBID) is a well established technique for highresolution direct material deposition from the gas phase onto a substrate. A finely focused electron beam of a scanning electron microscope or an electron beam writing system locally decomposes gas molecules which are adsorbed on the sample surface. The resulting volatile components are evacuated by the pumping system, while nonvolatile material is cross-linked in a kind of polymerization process, building up the deposit. In this project, the influence of acceleration voltage will be studied as a parameter. The influences of the length, diameter and shape of the deposited structures are also analyzed in this project.
Description: Access is limited to UniMAP community.
URI: http://dspace.unimap.edu.my/123456789/1984
Appears in Collections:School of Microelectronic Engineering (FYP)

Files in This Item:
File Description SizeFormat 
Abstract, Acknowledgment.pdf27.47 kBAdobe PDFView/Open
Conclusion.pdf17.19 kBAdobe PDFView/Open
Introduction.pdf20.19 kBAdobe PDFView/Open
Literature review.pdf29.61 kBAdobe PDFView/Open
Methodology.pdf87.46 kBAdobe PDFView/Open
References and appendix.pdf11.5 kBAdobe PDFView/Open
Results and discussion.pdf616.9 kBAdobe PDFView/Open


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