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dc.contributor.authorMuhammad Afif Abdul Rahman-
dc.date.accessioned2008-09-08T08:13:45Z-
dc.date.available2008-09-08T08:13:45Z-
dc.date.issued2008-03-
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/1984-
dc.descriptionAccess is limited to UniMAP community.-
dc.description.abstractElectron beam induced deposition (EBID) is a well established technique for highresolution direct material deposition from the gas phase onto a substrate. A finely focused electron beam of a scanning electron microscope or an electron beam writing system locally decomposes gas molecules which are adsorbed on the sample surface. The resulting volatile components are evacuated by the pumping system, while nonvolatile material is cross-linked in a kind of polymerization process, building up the deposit. In this project, the influence of acceleration voltage will be studied as a parameter. The influences of the length, diameter and shape of the deposited structures are also analyzed in this project.en_US
dc.language.isoenen_US
dc.publisherUniversiti Malaysia Perlisen_US
dc.subjectElectron beamsen_US
dc.subjectScanning electron microscopesen_US
dc.subjectSiliconen_US
dc.subjectMicroelectronicsen_US
dc.subjectMicroelectronic fabricationen_US
dc.titleStudy of acceleratin voltage influence the Conical structure during Electron Beam Induced Deposition (EBID)en_US
dc.typeLearning Objecten_US
dc.contributor.advisorShaiful Nizam Mohyar (Advisor)en_US
dc.publisher.departmentSchool of Microelectronic Engineeringen_US
Appears in Collections:School of Microelectronic Engineering (FYP)

Files in This Item:
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Abstract, Acknowledgment.pdf27.47 kBAdobe PDFView/Open
Conclusion.pdf17.19 kBAdobe PDFView/Open
Introduction.pdf20.19 kBAdobe PDFView/Open
Literature review.pdf29.61 kBAdobe PDFView/Open
Methodology.pdf87.46 kBAdobe PDFView/Open
References and appendix.pdf11.5 kBAdobe PDFView/Open
Results and discussion.pdf616.9 kBAdobe PDFView/Open


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