Please use this identifier to cite or link to this item:
http://dspace.unimap.edu.my:80/xmlui/handle/123456789/13826
Title: | Silicon carbide (SiC) as non-volatile random access memory (NVRAM) material |
Authors: | Cheong, Kuan Yew, Dr. |
Keywords: | Metal-oxide semiconductor (MOS) Nitrided gate oxide Silicon carbide (SiC) Nonvolatile random-access memory (NVRAM) |
Issue Date: | Aug-2005 |
Publisher: | The Institution of Engineers, Malaysia |
Citation: | p. 10-12, 14, 16 |
Series/Report no.: | Jurutera 2005 (8) |
Abstract: | The extraordinary intrinsic properties of silicon carbide (SiC) have made this material a suitablechoice to use in high temperature, high frequency, and high voltage applications. In addition to this, SiC could be employed as the base material for nonvolatile Random Access Memory, mainly due toits extremely low thermal-generation rate at room temperature. In this paper, the reasons of using thismaterial in this particular application are presented and the development of the application over thepast fifteen years is reviewed. |
Description: | Link to publisher’s homepage at http://www.myiem.org.my/ |
URI: | http://www.myiem.org.my/content/iem_bulletin_2004_2007-163.aspx http://dspace.unimap.edu.my/123456789/13826 |
ISSN: | 0126-9909 |
Appears in Collections: | Jurutera (Bulletin) |
Files in This Item:
File | Description | Size | Format | |
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silicon.pdf | 773.77 kB | Adobe PDF | View/Open |
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