Please use this identifier to cite or link to this item: http://dspace.unimap.edu.my:80/xmlui/handle/123456789/13826
Title: Silicon carbide (SiC) as non-volatile random access memory (NVRAM) material
Authors: Cheong, Kuan Yew, Dr.
Keywords: Metal-oxide semiconductor (MOS)
Nitrided gate oxide
Silicon carbide (SiC)
Nonvolatile random-access memory (NVRAM)
Issue Date: Aug-2005
Publisher: The Institution of Engineers, Malaysia
Citation: p. 10-12, 14, 16
Series/Report no.: Jurutera
2005 (8)
Abstract: The extraordinary intrinsic properties of silicon carbide (SiC) have made this material a suitablechoice to use in high temperature, high frequency, and high voltage applications. In addition to this, SiC could be employed as the base material for nonvolatile Random Access Memory, mainly due toits extremely low thermal-generation rate at room temperature. In this paper, the reasons of using thismaterial in this particular application are presented and the development of the application over thepast fifteen years is reviewed.
Description: Link to publisher’s homepage at http://www.myiem.org.my/
URI: http://www.myiem.org.my/content/iem_bulletin_2004_2007-163.aspx
http://dspace.unimap.edu.my/123456789/13826
ISSN: 0126-9909
Appears in Collections:Jurutera (Bulletin)

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