Ion implantation process of Lanthanum and Titanium Dopants into a substrate of FE80 CR20

Abstract

Ion implantation is the process of depositing a chemical species into a substrate by direct bombardment of the substrate with high-energy ion in such away the changing of physical properties of the solid species, therefore, taken place. The aim of this research is to show the ion implantation process into a substrate Fe80Cr20 with Lanthanum and Titanium dopants. Specimens, Fe80Cr20 were developed using powder metallurgy technique, Lanthanum and Titanium ions were implanted by using Cockcroft-Walton Type 200 keV/200 μA ion implantor with ion doses of 1017 ions/cm2 and kinetics energy 100 keV. The prediction of thin layer of dopants into surface of Fe80Cr20 was performed using a software called TRIM-SRIM simulation tools. The micro hardness test was conducted by the Vickers-micro hardness tester, and the characterization of microstructure was carried out by EDX, and SEM. The ion implantation process was succeeded to deposit the Lanthanum and Titanium dopants into the surface of Fe80Cr20. Predictive models for the effects of post-implantation processing, such as micro hardness, are also discussed in this paper.