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dc.contributor.authorHazian, Mamat
dc.contributor.authorZaliman, Sauli
dc.date.accessioned2009-12-11T07:58:30Z
dc.date.available2009-12-11T07:58:30Z
dc.date.issued2008-11-25
dc.identifier.citationp.631-633en_US
dc.identifier.isbn978-1-4244-3873-0
dc.identifier.urihttp://ieeexplore.ieee.org/xpls/abs_all.jsp?=&arnumber=4770405
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/7404
dc.descriptionLink to publisher's homepage at http://ieeexplore.ieee.orgen_US
dc.description.abstractMicrocontrollers are popular devices uses in small electronic applications. The microcontroller device using CMOS logic processing with 3 metal layers and without CMP tools it makes planarization of ILD's become tougher to handle with SOG machine alone. Most low yield happens when planarization of ILD's layer is not consistence. The standby leakage current was suspected from inter metal dielectric thickness and via 2 resist removal process, which cause the metal line shorting. Investigation has been made and our studies have been carried out to determine the root cause for standby leakage current problem which cause the yield to drop. By using AIT scanning machine, FESEM, thickness, solvent optimization, we are able to prove the root cause for one of the yield killer.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineering (IEEE)en_US
dc.relation.ispartofseriesProceedings of the International Conference on Semiconductor Electronics (ICSE 08)en_US
dc.subjectCMOS logic circuitsen_US
dc.subjectDielectric thin filmsen_US
dc.subjectIntegrated circuit yielden_US
dc.subjectLeakage currentsen_US
dc.subjectMicrocontrollersen_US
dc.subjectResistsen_US
dc.subjectCMOS logic processingen_US
dc.titleCMOS standby leakage current problems in microcontroller deviceen_US
dc.typeWorking Paperen_US
dc.contributor.urlhazian@mimos.myen_US


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