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Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
(Institute of Electrical and Electronics Engineers (IEEE), 2012)
In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ...
Microstructure and polymer choice in microfluidic interfacing for nanoscale biosensing
(Institute of Electrical and Electronics Engineers (IEEE), 2012-02-27)
Miniaturization of Biosensors based on nanotechnology are rapidly developing with gaining of undisputable ground and are becoming widespread in the biomedical with capability of improving the existing current
diagnosis ...