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    Macro and nanoscopic characteristics of SiC-SiO2 interface roughness and leakage current through vacuum annealed thermally nitrided SiO2 gate on 4H-SiC 

    Kuan, Yew Cheong; Wei, Chong Goh (Universiti Malaysia Perlis, 2010-06-09)
    10%-N2O nitrided SiO2 gate on n-type 4H SiC has been used to investigate macro and nanoscopic characteristics of SiC-SiO2 interface roughness and leakage current through the oxide. Non-contact mode atomic force microscope ...

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    AuthorKuan, Yew Cheong (1)Wei, Chong Goh (1)Subject
    4H SiC (1)
    Dielectric phenomena (1)International Conference on X-Rays & Related Techniques in Research & Industry (ICXRI) (1)Semiconductor-insulator interfaces (1)Surface roughening (1)... View MoreDate Issued2010 (1)

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