Search
Now showing items 1-1 of 1
Comparison on various developing method at clean track ACT 8 based on 0.5um CMOS Technology
(Universiti Malaysia Perlis, 2010-06-09)
Photoresist development is one of the critical steps in ensuring good critical dimension uniformity (CDU). In this paper, we demonstrate the methods by using 0.5um CMOS Technology Gate pattern. There methods used at our ...