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Now showing items 11-14 of 14
Silicon Nanowires
(AFAG Messen & Ausstellungen GmbH, 2007-11-01)
Silicon Nanowires with diameter or width of the order of a nanometer or 10o meter and length of the order of microns propel for a novel research in the construction of atomically controlled periodic systems with reduced ...
MOSFET Technology for Microelectronic Engineering Undergraduate Programme
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
This project focused on the process development of MOSFET fabrication. Microelectronic fabrication equipment and facilities from the micro fabrication cleanroom laboratory in KUKUM were used for the purposes of this project. ...
MOS Transistor Mask Design Using SEM Based E-Beam Lithography
(Malaysian Invention & Design Society (MINDS), 2006-05-19)
Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature ...
Nanowire formation using electron beam lithography
(American Institute of Physics, 2009-06-01)
Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ...