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Techniques in Integrated Circuit (IC) failure analysis
(ELectron Microscopy Society of Malaysia (EMSM), 2004-12-13)
Failure analysis (FA) plays an important role in the development and manufacturing of integrated circuits. It provides necessary information for technology advancement and for corrective action to improve quality ...
Nano patterning of cone dots and nano constrictions of negative e-beam resist for single electron transistor fabrication
(Springer New York, 2007-12)
We present an optimization of nano dot of negative tone e-beam resist which is a very important step in single electron transistor fabrication process. The optimum design of dot and nano constriction plays a significant ...