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Now showing items 11-15 of 15
Optimization of Nitride deposition process using Taguchi method
(Universiti Malaysia Perlis, 2008-04)
The process of plasma enhanced chemical vapor deposition silicon nitride film which is used as barrier layer for the doped oxide in premetal dielectric (PMD) application and optimized using Design of Experiment (DOE) ...
Optimization on oxidation process using 2K factorial design method
(Universiti Malaysia Perlis, 2008-04)
Silicon technologies progress in the last twenty years has traced the path to the
unprecedented revolution of information technologies, which has changed everybody’s
lifestyles. With the help of software, the world of ...
Design and analysis of low power using Sleepy Stack and Zig-Zag technique
(Universiti Malaysia Perlis, 2008-04)
Now days the design of CMOS becomes greater where the number of transistor in design increased largely. However there are some problem that occurs during the excellent
design and the increasing of transistor where the ...
Analysis of the deposited carbon during Electron Beam Induced Deposition (EBID) in Scanning Electron Microscope using Secondary Ion Mass Spectrometry (SIMS)
(Universiti Malaysia Perlis, 2008-03)
Many experiments on the mechanics of nanostructures require the creation of rigid
clamps at specific locations. In this work, electron beam induced deposition (EBID) has been used to deposit carbon films that are similar ...
Simulation for forming Shallow Trench Isolation in the IC using TCAD tools
(Universiti Malaysia Perlis, 2008-04)
A simulation for forming shallow trench isolation (STI) in the integrated circuit
(IC) is introduced. Firstly, using the Taurus Workbench-tools, the first silicon oxide layer and a silicon nitride layer are formed ...