Browsing School of Microelectronic Engineering (FYP) by Author "Mohd Azdi Asis"

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    • Study of the temperature effect on thickness and surface roughness of SiO2 

      Mohd Azdi Asis (Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-04)
      Oxidation is one of the most important thermal processes in semiconductor fabrication. The profile of oxide layer is varied to its different applications. Many factors can affect the profile of the SiO2 layer. In this ...