Study of acceleratin voltage influence the Conical structure during Electron Beam Induced Deposition (EBID)
| dc.contributor.advisor | Shaiful Nizam Mohyar (Advisor) | en_US |
| dc.contributor.author | Muhammad Afif Abdul Rahman | |
| dc.date.accessioned | 2025-10-16T15:43:19Z | |
| dc.date.issued | 2008-03 | |
| dc.description | Access is limited to UniMAP community. | |
| dc.description.abstract | Electron beam induced deposition (EBID) is a well established technique for highresolution direct material deposition from the gas phase onto a substrate. A finely focused electron beam of a scanning electron microscope or an electron beam writing system locally decomposes gas molecules which are adsorbed on the sample surface. The resulting volatile components are evacuated by the pumping system, while nonvolatile material is cross-linked in a kind of polymerization process, building up the deposit. In this project, the influence of acceleration voltage will be studied as a parameter. The influences of the length, diameter and shape of the deposited structures are also analyzed in this project. | en_US |
| dc.identifier.uri | http://dspace.unimap.edu.my/123456789/1984 | |
| dc.identifier.uri | https://dspace.unimap.edu.my/handle/123456789/30896 | |
| dc.language.iso | en | en_US |
| dc.publisher | Universiti Malaysia Perlis | en_US |
| dc.publisher.department | School of Microelectronic Engineering | en_US |
| dc.subject | Electron beams | en_US |
| dc.subject | Scanning electron microscopes | en_US |
| dc.subject | Silicon | en_US |
| dc.subject | Microelectronics | en_US |
| dc.subject | Microelectronic fabrication | en_US |
| dc.title | Study of acceleratin voltage influence the Conical structure during Electron Beam Induced Deposition (EBID) | en_US |
| dc.type | Learning Object | en_US |
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