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Fabrication and characterization of 50 nm silicon nano-gap structures
(American Scientific Publishers, 2011-04)
A simple method for the fabrication of nano-gaps less than 50 nm by using conventional photolithography combined with patterned-size reduction techniques is presented. Silicon material is used to fabricate the nano-gap ...
Fabrication and characterization of gold nano-gaps for ssDNA immobilization and hybridization detection
(Journal of New Materials for Electrochemical Systems, 2011)
We develop a method for fabricating the nano-gaps directly by using just photolithography and wet etching processes without any nano lithography or difficult techniques. It shows that this resolution enhancement allows one ...