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dc.contributor.authorN. K., Hassan
dc.contributor.authorM. Roslan, Hashim
dc.contributor.authorYarub, Al - Douri
dc.contributor.authorK. Al - Heuseen
dc.date.accessioned2013-07-10T05:52:18Z
dc.date.available2013-07-10T05:52:18Z
dc.date.issued2012
dc.identifier.citationInternational Journal of Electrochemical Science, vol. 7(5), 2012, pages 4625-4635en_US
dc.identifier.issn1452-3981
dc.identifier.urihttp://electrochemsci.org/papers/vol7/7054625.pdf
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/26552
dc.descriptionLink to publisher's homepage at http://www.electrochemsci.org/en_US
dc.description.abstractZinc oxide (ZnO) nanostructure with a hexagonal structure is deposited on Si (100) substrates through electrochemical deposition (ECD) using a current density of 2, 3, and 4 mA/cm 2 for 1.5 h. The photoluminescence (PL) intensity of the films has large peaks around the ultraviolet and green emission. The green emission may correspond to the electron transition from the defects to the valence band. The intensity of these two emissions changes with respect to the current density. X-ray diffraction (XRD) measurements show that the peaks of these grown samples refer to the ZnO with a hexagonal structure and a preferable orientation of (101). Refractive index, optical dielectric constant, and bulk modulus are investigated in the ZnO nanostructure. The obtained results are in good agreement with the experimental and theoretical ones.en_US
dc.language.isoenen_US
dc.publisherElectrochemical Science Group (ESG)en_US
dc.subjectBulk modulusen_US
dc.subjectElectrochemical depositionen_US
dc.subjectNanostructureen_US
dc.subjectRefractive indexen_US
dc.subjectZinc oxide (ZnO)en_US
dc.titleCurrent dependence growth of ZnO nanostructures by electrochemical deposition techniqueen_US
dc.typeArticleen_US
dc.contributor.urlroslan@usm.myen_US


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