Browsing School of Microelectronic Engineering (Articles) by Subject "Metal oxide semiconductors, Complementary"
Now showing items 1-2 of 2
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Alignment mark architecture effect on alignment signal behavior in advanced lithography
(Institute of Electrical and Electronics Engineering (IEEE), 2006)The downscaling of CMOS technology becomes a challenge to the scanner alignment system since overlay and alignment accuracy becomes tighter. Such a tight overlay requirement requires a very stable alignment performance. A ... -
Borophosphosilicate glass (BPSG) reflow characterization for submicron CMOS technology
(Universiti Kebangsaan Malaysia, 2007)This paper involves the planarization of borophosphosilicate glass (BPSG) film using a new recipe for annealing process to improve the borophosphosilicate glass (BPSG) film flatness after reflow. This improvement is for ...