Browsing Uda Hashim, Prof. Ts. Dr. by Subject "Pattern transfer"
Now showing items 1-4 of 4
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Design and fabricate Mosfet Masks at KUKUM Microfabrication Cleanroom for teaching undergraduates
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)In teaching undergraduates program in MOSFET fabrication, mask set is one of the major problem since the cost is extensively high. The purpose of these masks is to define certain region on a wafer. In this work, a low ... -
Mask design and fabrication of Micro/Nanowire biochip for reliable and repeatability pattern transfer
(Trans Tech Publications, 2014)In Micro/Nanowire fabrication, the alignment and exposure process are the most critical steps in photolithography process, and indeed for the whole biochip processing. This process determines the success of transferring ... -
Mask design for the reproducible fabrication and reliable pattern transfer for polysilicon nanowire
(Institute of Electrical and Electronics Engineers (IEEE), 2012)In fabrication of Nanowire alignment and exposure are the most critical steps in photolithography process, the resolution requirements and precise alignment are vital, each mask needs to be precisely aligned with original ... -
Mask design platform for zinc oxide nanowire growth
(Trans Tech Publications, 2013)This paper mainly represent the simple and effective method to design the chrome mask for patterning the platform for zinc oxide nanowire growth. The most essential aspect that need to be considered in designing the chrome ...