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Now showing items 31-38 of 38
Si-quantum Dots (QD) and SiO2 tunnel barriers
(Universiti Malaysia Perlis (UniMAP), 2008-07)
Oxidation of Si for nanostructures on silicon-on-insulator
(SOI) substrates is a key process in the fabrication of Si
single electron transistor (SET). The most di cult aspect of
the fabrication process is the formation ...
Electrode design and planar uniformity of anodically etched small area porous silicon
(American Institute of Physics, 2009-06-01)
Porous silicon layer microstructure is sensitive to many parameters, which need to be controlled during etching. These include not only anodization time, current density, applied potential and electrolyte composition but ...
MOSFET Technology for Microelectronic Engineering Undergraduate Programme
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
This project focused on the process development of MOSFET fabrication. Microelectronic fabrication equipment and facilities from the micro fabrication cleanroom laboratory in KUKUM were used for the purposes of this project. ...
Portable AEROHUB- UniMAP Fire Fighter
(Malaysian Invention and Design Society (MINDS), 2007-05-18)
AEROHUBTM aerosol fire suppression system represents a dramatic advancement in fire protection over alternative Halon, CO2, dry chemical and Water system.
KUKUM Artificial Marble
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
KUKUM artificial marble can be processed as one-piece structure, so it can eliminates the problem of assembly by providing a one piece solution.
A Cost Effective Negative Plenum Cleanroom for Microelectronic Engineering Undergraduate Programme
(Kementerian Pengajian Tinggi Malaysia (KPTM), 2005-09-30)
To design and build a microelectronic cleanroom which is compatible to other commercially installed clenroom for the purpose of teaching undergraduate and postgraduate students in the field of microelectronic fabrication.
MOS Transistor Mask Design Using SEM Based E-Beam Lithography
(Malaysian Invention & Design Society (MINDS), 2006-05-19)
Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature ...
The application of Nitride semiconductor materials
(Kolej Universiti Kejuruteraan Utara Malaysia, 2004-12)